Specifications:
▪ Advanced Drop Analysis (ADA) for best ink jetting performance
▪ Automatic Print Optimization (APO) for best application results
▪ Substrate chuck cooling
▪ Dual printhead configuration
▪ Ink tank heating
▪ UV LED pinning and curing
▪ Laser source module
▪ Customized substrate holders
▪ Glovebox integration for inert environment
▪ JS20 printhead storage station
▪ Printer table with storage cabinet and monitor/keyboard swing arm
▪ Recirculating ink supply for nanoparticle inks
▪ Advanced Gerber File Rasterizer
▪ Maximum substrate size: 227 x 327 mm
▪ Maximum substrate thickness: 25 mm
▪ Substrate temperature control: Heating up to 90 °C (optional cooling down to 4 °C)
▪ Stage accuracy: +/- 20 μm (3σ)
▪ Stage precision: +/- 5 μm (3σ)
▪ Motion: X, Y, Z, Rotation of substrate table and printhead
▪ Print speed: Up to 500 mm/s
▪ Printheads: 16 - 2048 nozzles; 1 - 80 pL dropsize
▪ Ink types: Solvent based, nanoparticle, aqueous, hotmelt, UV-curable
▪ Ink viscosity: 2 - 20 cP
▪ Integrated post processing (optional): UV pinning or curing
▪ Footprint (W x D x H): Approx. 770 x 620 x 410 mm (excl. PC and monitor)
▪ Weight: Approx. 90 kg
Industrial printheads:
▪ Fujifilm Dimatix S-class, SE3/SX3, Sapphire, Emerald, Samba G3L, DMC
▪ Konica Minolta KM512, KM1024i
▪ XAAR 1003er series
▪ OCE CrystalPoint C29