OFERTA FORMATIVA DCM - FCT/UNL
Navigation
ELETTRORAVA PECVD
Location: Clean room CEMOP – thin-film deposition lab
Responsible: Tiago Mateus, Hugo Águas
Description:
Plasma Enhanced Chemical Vapor Deposition tool, spider type system for depositing amorphous (a-Si) and nano-crystalline (nc-Si) silicon thin films and solar cells.
Specifications:
• 3 PECVD chambers dedicated to intrinsic, n and p doped silicon deposition with ad-justable electrode Z position
• 8 gas lines with mass flow controllers (SiH4, H2, PH3, TMB, CH4, O2, Ar, CH4)
• 1 VHF generator up to 100MHz
• 1 PVD chamber dedicated to deposit TCO
• 1 magnetron source for 3” targets, with adjustable Z position
• 1 DC-pulsed generator
• 1 central load lock chamber
• 2 RF generator
• 1 VHF generator up to 100MHz
• Heated chambers up to 400°C
• UPS emergency power supply
• Gas scrubber for emission treatment
Responsible: Tiago Mateus, Hugo Águas
Description:
Plasma Enhanced Chemical Vapor Deposition tool, spider type system for depositing amorphous (a-Si) and nano-crystalline (nc-Si) silicon thin films and solar cells.
Specifications:
• 3 PECVD chambers dedicated to intrinsic, n and p doped silicon deposition with ad-justable electrode Z position
• 8 gas lines with mass flow controllers (SiH4, H2, PH3, TMB, CH4, O2, Ar, CH4)
• 1 VHF generator up to 100MHz
• 1 PVD chamber dedicated to deposit TCO
• 1 magnetron source for 3” targets, with adjustable Z position
• 1 DC-pulsed generator
• 1 central load lock chamber
• 2 RF generator
• 1 VHF generator up to 100MHz
• Heated chambers up to 400°C
• UPS emergency power supply
• Gas scrubber for emission treatment
