Scanning Electron Microscopy Focused Ion Beam (SEM-FIB) workstation

Location: Nanofabrication Lab
Responsible: Pedro Barquinha

 

New generation of CrossBeam system allowing for unique imaging possibilities, advanced analytics and precise processing at a nanoscale level.

The main features of the equipment are described below:
•    SEM column;
•    Schottky Field Emitter, resolution of 1.0 nm @ 15 kV, 1.9 nm @ 1 kV, acceleration voltage between 0.1 and 30 kV;
•    FIB column;
•    Ga liquid metal ion source (LMIS), resolution <7 nm @ 30 kV, acceleration voltage between 1 and 30 kV, probe current between 1 pA and 50 nA;
•    Imaging with different detectors ;
•    Everhart-Thornley type SE, In-lens SE and BSD detectors. Possibility of 3D reconstruction using combined SEM and FIB columns;
•    Microstructural and chemical analysis;
•    Oxford INCA Energy 350 (EDS), Oxford HKL Advance, Nordlys II-S (EBSD, EBSD 3D);
•    Gas injection system;
•    Deposition of C, Pt and SiO2, selective etching of dielectrics with XeF2, local charge compensation system to reduce charging effects in non-conductive samples;
•    Lithography;
•    Nanolithography using electrons or ions, milling of imported bitmaps or CAD files, electrostatic beam blanker;
•    Heating stage;
•    Kammrat & Weiss, heating up to 1050 °C for in-situ analysis of sample evolution with temperature;
•    Nanoprobes;
•    4 Kleindiek nanotechnik nanomanipulators for electrical measurements of nanodevices.