OFERTA FORMATIVA DCM - FCT/UNL
Navigation
Heidelberg µPG 101 Tabletop Micro Pattern Generator
Location: Clean room CEMOP – lithography lab
Responsible: Pedro Barquinha
Description:
Tabletop micropattern generator for direct writing applications and low volume mask fabrication, compatible with up to 6” substrates and enabling features sizes with 600 nm resolution.
Specifications:
• Substrate size from 1 cm x 1 cm to 15 cm x 15 cm
• Substrate thickness up to 12 mm
• UV Laser diode, 375 nm, 70 mW for exposure of positive and negative resist, including SU8
• Camera system for substrate inspection and automatic alignment
• Real-time autofocus
• Two writing modes:
o Mode I – minimum structure size 0.6 µm, write speed 1 mm2/min, write area 5 cm x 5 cm
o Mode IV – minimum structure size 5 µm, write speed 90 mm2/min, write area 12.5 cm x 12.5 cm
• PC for system control and data conversion (DXF, CIF and GDSII), with built-in LayoutEditor CAD software for pattern design/editing
Responsible: Pedro Barquinha
Description:
Tabletop micropattern generator for direct writing applications and low volume mask fabrication, compatible with up to 6” substrates and enabling features sizes with 600 nm resolution.
Specifications:
• Substrate size from 1 cm x 1 cm to 15 cm x 15 cm
• Substrate thickness up to 12 mm
• UV Laser diode, 375 nm, 70 mW for exposure of positive and negative resist, including SU8
• Camera system for substrate inspection and automatic alignment
• Real-time autofocus
• Two writing modes:
o Mode I – minimum structure size 0.6 µm, write speed 1 mm2/min, write area 5 cm x 5 cm
o Mode IV – minimum structure size 5 µm, write speed 90 mm2/min, write area 12.5 cm x 12.5 cm
• PC for system control and data conversion (DXF, CIF and GDSII), with built-in LayoutEditor CAD software for pattern design/editing
