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2016
b Deuermeier J a, Wardenga HF b, Morasch J b, c Siol S b, Nandy S a, Calmeiro T a, Martins R a, Klein A b, Fortunato E a.  2016.  Highly conductive grain boundaries in copper oxide thin films. Journal of Applied Physics. 119 Abstract
b Deuermeier J a, d Bayer TJM b, Yanagi H c, Kiazadeh A a, Martins R a, Klein A b, Fortunato E a.  2016.  Substrate reactivity as the origin of Fermi level pinning at the Cu2O/ALD-Al2O3 interface. Materials Research Express. 3 Abstract