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2016
b c Shan F a
,
b c Liu A a
,
Zhu H c
,
Kong W a
,
Liu J c
,
Shin B d
,
Fortunato E e
,
Martins R e
,
b c Liu G a
. 2016.
High-mobility p-type NiOx thin-film transistors processed at low temperatures with Al2O3 high-k dielectric
.
Journal of Materials Chemistry C. 4:9438-9444.
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